Open Fabs

Zenaan Harkness zen at freedbms.net
Wed Jul 29 02:27:53 PDT 2015


On 7/29/15, wirelesswarrior at safe-mail.net <wirelesswarrior at safe-mail.net> wrote:
> For CPunks what's needed is a DIY Electron Beam Litho apparatus. Its
> basically an electron microscope in reverse. For relatively simple chips it
> could be more than adequate as its possible eliminates the need and
> complexity, chemistry, etc. for masks and can perform most all process
> functions (doping, implantation, etc.) and attain feature sizes commensurate
> with current foundary tech. AFAIK, its possible to build from used
> e-microscopes though maintaining calibration and linarity is something best
> learned in a working environment at someone else's expense. :) One of the
> main shortcomings of EBL is its low production  rate since all features must
> be developed by "writing" them, like an old stylevector display, on the
> substrate.

Whereas with "photon lithography" (terminology?) a light source covers
an area (of the mask?) which is then lens-focused down to the
appropriate scale (eg 24nm) onto the silicon and etc physical layer?
Firstly is this minimal understanding correct?

Secondly is there any potential areal electron emission device (as
opposed to point electron emission device) comparable to current litho
tech (areal photon emission)?



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