Open Fabs

[wirelesswarrior at Safe-mail.net]

-------- Original Message --------
From: Zenaan Harkness <zen at freedbms.net>
Apparently from: cypherpunks-bounces at cpunks.org
To: cypherpunks at cpunks.org
Subject: Re: Open Fabs
Date: Wed, 29 Jul 2015 09:27:53 +0000

> On 7/29/15, wirelesswarrior at safe-mail.net <wirelesswarrior at safe-mail.net> wrote:
> > For CPunks what's needed is a DIY Electron Beam Litho apparatus. Its
> > basically an electron microscope in reverse. For relatively simple chips it
> > could be more than adequate as its possible eliminates the need and
> > complexity, chemistry, etc. for masks and can perform most all process
> > functions (doping, implantation, etc.) and attain feature sizes commensurate
> > with current foundary tech. AFAIK, its possible to build from used
> > e-microscopes though maintaining calibration and linarity is something best
> > learned in a working environment at someone else's expense. :) One of the
> > main shortcomings of EBL is its low production  rate since all features must
> > be developed by "writing" them, like an old stylevector display, on the
> > substrate.
> 
> Whereas with "photon lithography" (terminology?) a light source covers
> an area (of the mask?) which is then lens-focused down to the
> appropriate scale (eg 24nm) onto the silicon and etc physical layer?
> Firstly is this minimal understanding correct?
> 
> Secondly is there any potential areal electron emission device (as
> opposed to point electron emission device) comparable to current litho
> tech (areal photon emission)?

There was research and patenting in this area beginning in the 60-70s but I not seen any articles showing use.