-------- Original Message -------- From: Zenaan Harkness <zen@freedbms.net> Apparently from: cypherpunks-bounces@cpunks.org To: cypherpunks@cpunks.org Subject: Re: Open Fabs Date: Wed, 29 Jul 2015 09:27:53 +0000

On 7/29/15, wirelesswarrior@safe-mail.net <wirelesswarrior@safe-mail.net> wrote:

...

For CPunks what's needed is a DIY Electron Beam Litho apparatus. Its basically an electron microscope in reverse. For relatively simple chips it could be more than adequate as its possible eliminates the need and complexity, chemistry, etc. for masks and can perform most all process functions (doping, implantation, etc.) and attain feature sizes commensurate with current foundary tech. AFAIK, its possible to build from used e-microscopes though maintaining calibration and linarity is something best learned in a working environment at someone else's expense. :) One of the main shortcomings of EBL is its low production rate since all features must be developed by "writing" them, like an old stylevector display, on the substrate.

Whereas with "photon lithography" (terminology?) a light source covers an area (of the mask?) which is then lens-focused down to the appropriate scale (eg 24nm) onto the silicon and etc physical layer? Firstly is this minimal understanding correct?

Secondly is there any potential areal electron emission device (as opposed to point electron emission device) comparable to current litho tech (areal photon emission)?

There was research and patenting in this area beginning in the 60-70s but I not seen any articles showing use.